Official summary
What is being procured?
DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for etching lithium niobate on insulator 150 mm wafer processing. Delivery is expected no later than Q4 2027. We are looking for a highly versatile instrument providing stable etch recipes, capable of etching at both nanometer scale and micrometer scale with precise control of etching depth, typically a few hundreds of nm. The instrument must have state-of-the-art performance in terms of profile control, uniformity, selectivity, and in particu-lar etching sidewall smoothness to achieve low waveguide loss. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools.…
Notice history
Procurement timeline
Follow the main stages and updates linked to this procurement procedure.
No other related notice has been identified yet.
Data is restructured for easier reading. The official notice and procurement documents always prevail.
Source and reliability
TED · 628101-2026. Checked on Sep 11, 2026, 10:05 AM.
Data is restructured for easier reading. The official notice and procurement documents always prevail.