Ametlik kokkuvõte · English
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DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for etching lithium niobate on insulator 150 mm wafer processing. Delivery is expected no later than Q4 2027. We are looking for a highly versatile instrument providing stable etch recipes, capable of etching at both nanometer scale and micrometer scale with precise control of etching depth, typically a few hundreds of nm. The instrument must have state-of-the-art performance in terms of profile control, uniformity, selectivity, and in particu-lar etching sidewall smoothness to achieve low waveguide loss. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools.…
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Ametlik kokkuvõte · English
DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for etching lithium niobate on insulator 150 mm wafer processing. Delivery is expected no later than Q4 2027. We are looking for a highly versatile instrument providing stable etch recipes, capable of etching at both nanometer scale and micrometer scale with precise control of etching depth, typically a few hundreds of nm. The instrument must have state-of-the-art performance in terms of profile control, uniformity, selectivity, and in particu-lar etching sidewall smoothness to achieve low waveguide loss. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools.…
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TED · 628101-2026. Kontrollitud 11. sept 2026 10:05.
Andmed on lihtsamaks lugemiseks ümber struktureeritud. Alati on ülimuslikud ametlik teade ja hankedokumendid.