Delivery and installation of a High ion density etcher for lithium niobate on insulator - LiNb03 (LN)

Amtliche Zusammenfassung · English

Was wird beschafft?

DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for etching lithium niobate on insulator 150 mm wafer processing. Delivery is expected no later than Q4 2027. We are looking for a highly versatile instrument providing stable etch recipes, capable of etching at both nanometer scale and micrometer scale with precise control of etching depth, typically a few hundreds of nm. The instrument must have state-of-the-art performance in terms of profile control, uniformity, selectivity, and in particu-lar etching sidewall smoothness to achieve low waveguide loss. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools. It serves a diverse community of over 200 active users, ra

Unverbindliche maschinelle Übersetzung. Die offizielle Zusammenfassung bleibt maßgeblich.