Official summary
What is being procured?
Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.
Free
Get the next tenders in this sector
Receive new notices matching your criteria in a weekly email. Check or adjust your criteria before activating your free alert.
Preparation checklist
Prepare my response
Checks to carry out in the official documents. This guide is not an automated document analysis.
- Read the complete documents and amendments
- Check participation conditions and required documents
- Check whether a site visit or meeting is required
- Review award criteria and their weighting
- Check available resources, budget and schedule
- Confirm the submission process and deadline
TED · 700865-2026. Checked on Oct 12, 2026, 11:05 AM.
https://ted.europa.eu/en/notice/-/detail/700865-2026
Analyse this notice with AI
AI analyses are available with Pro or Team.
Notice and PDF analyses use the same allowance.
Notice history
Procurement timeline
Follow the main stages and updates linked to this procurement procedure.
Data is restructured for easier reading. The official notice and procurement documents always prevail.
Source and reliability
TED · 700865-2026. Checked on Oct 12, 2026, 11:05 AM.
Data is restructured for easier reading. The official notice and procurement documents always prevail.