Službeni sažetak · English
Što se nabavlja?
Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.
Strojni prijevod za lakše razumijevanje. Službeni sažetak ostaje mjerodavan.
Službeni sažetak · English
Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The system is intended for etching of silicon as well as other materials compatible with silicon etching, with both photoresist resins and hard masks for patterning.
Povijest obavijesti
Vremenski slijed postupka nabave
Pratite glavne faze i izmjene povezane s ovim postupkom nabave.
-
Obavijest o ispravku
· TED 700865-2026
Izmijenjeni odjeljci: 1Pogledajte obavijest na Tenderivi
Otvorite službenu obavijest ↗
Podaci su preuređeni radi lakšeg čitanja. Službena obavijest i dokumentacija uvijek imaju prednost.
Izvor i pouzdanost
TED · 693624-2026. Provjereno 8. lis 2026. 11:05.
Podaci su preuređeni radi lakšeg čitanja. Službena obavijest i dokumentacija uvijek imaju prednost.