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Denmark · Industrial machinery

Official title · English

Delivery and installation of a ICP Reactive ion etcher for silicon dielctrics

Danmarks Tekniske Universitet - DTU · Denmark

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Official summary

DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for oxides and nitrides of silicon to become its new primary instrument for 150 mm wafer processing. Delivery is expected no later than Q3 2027. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools. It serves a diverse community of over 200 active users, ranging from novice…

What is being procured?
Deadline Nov 23, 2026 22:55 UTC
Estimated valueNot announced
PublishedOct 12, 2026
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Official summary

What is being procured?

DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for oxides and nitrides of silicon to become its new primary instrument for 150 mm wafer processing. Delivery is expected no later than Q3 2027. The Instrument will be installed in the DTU Nanolab cleanroom - a university facility providing a comprehensive suite of micro- and nanofabrication tools. It serves a diverse community of over 200 active users, ranging from novice students to experienced researchers, as well a high percentage of commercial clients. As an open access tool, the Instrument must support the full spectrum of etching of silicon-based dielectrics, from sub 100 nm nanostructures defined by electron beam lithography to depths of several tens of microns.…

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TED · 701524-2026. Checked on Oct 12, 2026, 11:05 AM.
https://ted.europa.eu/en/notice/-/detail/701524-2026

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TED · 701524-2026. Checked on Oct 12, 2026, 11:05 AM.

Data is restructured for easier reading. The official notice and procurement documents always prevail.

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