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Teideal oifigiúil · Nederlands

EUV TRACK (HNA/LNA)

Imec EU Pilot line NV · an Bheilg

Féach ar fhógraí faoin ainm seo
Achoimre oifigiúil · Nederlands

The high NA - EUV track will support a High NA EUV scanner it gets linked to. The track will prepare the wafers before the exposure, this is pre-treatment of the wafers before coating, the coating of underlayer and photo resist followed by a post application bake. After exposure the track will execute the post exposure bake and development of the photo sensitive material to get the pattern fixed. The track modules need to be precisely controlled to…

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Foilsithe2 DFómh 2026
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Achoimre oifigiúil · Nederlands

Cad atá á sholáthar?

The high NA - EUV track will support a High NA EUV scanner it gets linked to. The track will prepare the wafers before the exposure, this is pre-treatment of the wafers before coating, the coating of underlayer and photo resist followed by a post application bake. After exposure the track will execute the post exposure bake and development of the photo sensitive material to get the pattern fixed. The track modules need to be precisely controlled to achieve superior results in uniformity within the wafer and from wafer to wafer. It also needs to enable the processing of a wide variety of materials to support the further scaling and continuous evolving semiconductor devices. The low NA - EUV track will support a Low NA EUV scanner it gets linked to.…

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  1. Fógra toraidh Fógra atá á léamh

    · TED 680011-2026

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Tá na sonraí athstruchtúrtha chun iad a léamh níos éasca. Is iad an fógra oifigiúil agus na doiciméid soláthair a bhíonn i réim i gcónaí.

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TED · 680011-2026. Seiceáilte ar 2 DFómh 2026 11:05.

Tá na sonraí athstruchtúrtha chun iad a léamh níos éasca. Is iad an fógra oifigiúil agus na doiciméid soláthair a bhíonn i réim i gcónaí.

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